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Manuscript Title: Modeling of glow discharge sputtering systems: computer program.
Authors: I. Abril
Program title: ALACANT
Catalogue identifier: ABFC_v1_0
Distribution format: gz
Journal reference: Comput. Phys. Commun. 51(1988)413
Programming language: Fortran.
Computer: VAX-11/730.
Operating system: VMS V4.2.
RAM: 33K words
Word size: 32
Keywords: Plasma physics, Discharge, Glow discharges, Sputtering, Etching, Deposition.
Classification: 19.5.

Nature of problem:
This program treats the charge-exchange and ionization processes that take place in the region of spatial charge or cathode fall region in a glow discharge and the transport of sputtered matter through the plasma region to the substrate. We calculate self-consistently the electric field in the cathode fall region, the extent of the dark space, the flux energy distributions of energetic particles (ions, neutrals and electrons), the current density of ions and electrons in the cathode fall region, the net etching rate of the cathode and the deposition rate at the substrate in a glow discharge sputtering systems.

Solution method:
The computer code solves self-consistently a system of coupled intesro- differential equations, using a numerical iterative scheme. The inclusion of the contributions due to the electrons requires succesive iterations towards and from the cathode in order to ensure convergence.

Restrictions:
The only free parameter of the whole theory is the current density at the cathode, that must be estimated or taken from experimental data.

Running time:
The running time depends on the choice of the number of sub-intervals in which the cathode potential is divided, and on the number of iterations that are necessary to reach convergence.